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,,ASMLScannerGeneralIntroduction,CourseOverview,SystemOverviewBasicOperationRecovery,PAS5500WAFERSCANNEROVERVIEWPurposeThePAS5500isafullyautomaticstep-and-repeatcameraforexposingwafersusedformanufacturingofintegratedcircuits.Thesystemformspartofalithographicprocess,andissuitableforbatchproductionoflargeandverylargescaleintegratedcircuits.,SystemOverview,ThePAS5500waferscannercomprisesthefollowingmainunits:Exposureunit,Wafertransportsystem,Operatorconsole,Electronicscabinet,ContaminationandTemperature(C&T)cabinet.,SystemOverview,SystemOverview,SystemOverview,SAFETYOVERVIEWOFPOTENTIALHAZARDSThemainhazardsrelatedtothePAS5500/500,/550,/700are:Laserradiation,includinghighintensitydeepultraviolet(DUV)laserradiationof248nmLasergases,includingvery-toxicfluorineMechanicalmovements.Otherhazardsare:MagneticfieldsRemotecontroloftheunitusingtheRemoteMonitoringandControlSystem(RMCS),SystemOverview,SystemOverview,SYMBOLS,SYSTEMBUILDUPThemainunitsofthePAS5500canbefurtherdividedintothefollowingsubsystems:AM(AirMount)ARMS(AdvancedReticleManagementSystem)IRIS(IntegratedReticleInspectionSystem)WH(WaferHandling)LS(LevelSensor)SWS(ScanningWaferStage)SRS(ScanningReticleStage)AL(Alignment)IS(ImageSensor)IP&IL(IlluminationandProjection)OA(Off-Axisillumination,ATHENA)CT(ContaminationandTemperaturecontrol),SystemOverview,AirmountSeparatingmachineintotwoparts:SilentWorldandExternalWorldPurpose:VibrationIsolationPositionControlDiagnosticTool,Sub-Modules,Advancedreticlemanagementsystem(ARMS)PurposeThepurposeoftheARMS,istoprovideameansofautomaticallyretrievingandplacingthedesiredreticleaccuratelyonthereticletable.Toaccomplishthisthesystemmust:1.ControltheStandardMechanicalInterFace(SMIF)port,2.Identifythereticles,3.Loadandunloadreticlesto/fromthelibrary,4.Prealignthereticleonthereticletable,5.Placeandremovethereticleonthereticletable,6.Importtherelativemachineconstantsandlayoutdata(ifavailable),Sub-Modules,WAFERHANDLINGPurposeTheWHsystemhastwoprimaryfunctions.Itsfirstmaintaskistotransportwafersbetweenacarrier(orapedestal)andtheprealignmentsystem,thistaskisperformedbytheWaferTransportSystem(WTS).Itssecondmaintaskistoprealignawaferthathascomefromthewafertransportsystem,sothatitcanbeacceptedbythewaferstage.ThisisaccomplishedbytheWaferPrealignmentSystem(WPS).,Sub-Modules,Sub-Modules,Sub-Modules,Sub-Modules,LEVELSENSORPurposeThePAS5500projectsreticleimagesontowafersatanextremelyhighresolution.Highresolutioncanonlybeachievedwhenthewaferisaccuratelypositionedintheoptimumfocalplane.TheUsableDepthOfFocus(UDOF),thatistherangeinwhichimagescanbesharplyreproduced,isonlyafewmicrometres.Whenusingextremelyfineresolution,itcanbeaslowasonemicrometre.Thepurposeofthelevelsensorsubsystemisto:1.Determinethedistancebetweenthewafersurfaceandthebottomsurfaceoftheprojectionlens,2.Controlthewaferstagelevelactuatorstobringthewafersurfaceintothedesiredoptimumimageplane.,Sub-Modules,Sub-Modules,ALIGNMENTPurposeThefunctionofthealignmentsystemistoalignthewafertothereticleonthereticletable.Thespecificationiscriticalbecauseawafercanbeexposedupto30times,sogoodoverlayaccuracyisrequired.,Sub-Modules,Sub-Modules,Sub-Modules,ILLUMINATIONANDPROJECTIONPurposeThepurposeoftheilluminationsystemistoexposethereticleimagethroughtheprojectionlensontothewafer.Theilluminationsystemcreatesalightbeamofhighintensityandevenuniformity,atreticlelevel,whichhastheproperspectralcomposition.,Sub-Modules,Sub-Modules,BasicOperation,UnixSystem/PASSoftware,BasicOperation,PASSoftwarePASSoftwareisanapplicationsoftwareunderSolarisSys,whichisakindofUnixsystem.Inmostcases,weoperatethemachinewithPASSoftware,butsometimesweneedtotypecommandsincommandwindowforlowlevelfunctions.,BasicOperation,MainMenu,BasicOperation,BasicOperation,MaterialMonitorWecanmonitorthewafersandreticlesinsidethemachine.,BasicOperation,CmdHdlWecanoperatetheallthesub-systemsofthemachinethroughthiswindow.,BasicOperation,MaterialHandlingWithinthiswindow,wafersandreticlescanbeloadedorunloadedfromthemachine.,BasicOperation,CmdtoolLowlevelunixcommandscanbeexecutedinthiswindow.,

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