signature=a9a2446a007dd01924e436fbddd97c6b,Measuring plurality of first patterns formed over substra...

摘要：

When, over a substrate over which a plurality of first patterns each having plural basic regions formed in an exposure region of one shot, second patterns are formed by plural shots of exposure corresponding to the respective basic regions, positions of alignment marks are measured for said plurality of first patterns formed over the substrate to thereby give first positional information; relative positions of said plurality of first patterns with respect to a first coordinate system with the center of the substrate as the origin are given, based on the first positional information measured, to thereby compute first disalignments of said plurality of first patterns with respect to the first coordinate system; second positional information given by subtracting the first disalignments from the first positional information is computed; relative positions of said plural basic regions with respect to a second coordinate system with the shot center of the first pattern as the origin are given, based on the second positional information, to thereby compute second disalignments of the first pattern with respect to the second coordinate system; third positional information given by subtracting the first disalignments and the second disalignments from the first positional information are computed; third disalignments of the first pattern with respect to a third coordinate system with the shot center of the second pattern as the origin are computed, based on the third positional information; and positioning with respect to the first pattern is made when the second pattern is exposed, based on the first to the third disalignments.

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