xrd连续扫描和步进扫描_扫描电子显微镜ZEISS EVO15

品名：扫描电子显微镜 

ProductName: Scanning Electron Microscope

品牌：ZEISS

Brand:ZEISS

型号：EVO15

Model:EVO15

工作原理：

电子枪发出一束高能量的电子束，电子束经电子光学系统聚集后射到样品上。为了确保高速电子在运动中不受阻碍，真空系统将镜筒和样品室抽成高真空。电子束射到样品上，并在样品上进行光栅扫描(与显示器上的扫描同步)。高能电子在样品上激发出的二次电子被二次电子探测器接收，二次电子的产额与样品的形貌有关，此信号经放大处理后，送到显示器调制其亮度，便在屏幕上显示出电子束扫描位置的图像。屏幕上图像尺寸与电子束在样品上扫描范围的尺寸之比，即是图像的放大倍数。

Working principle: 

The electron gun emits a high-energy electron beam, which iscollected by the electron optical system and then hits the sample. In order toensure that high-speed electrons are not hindered in movement, the vacuumsystem evacuates the lens barrel and sample chamber to a high vacuum. Theelectron beam hits the sample, and raster scans on the sample (synchronizedwith the scan on the display). The secondary electrons excited by thehigh-energy electrons on the sample are received by the secondary electrondetector. The yield of the secondary electrons is related to the shape of thesample. After the signal is amplified, it is sent to the display to modulateits brightness, and then it is displayed on the screen. The image of thescanning position of the electron beam is displayed. The size of the image onthe screen and the scanning range of the electron beam on the sample Theratio of the size is the magnification of the image.

 技术参数：

1. 发射源：钨灯丝

2. 分辨率：二次电子像 3.0nm@30kV ；背散射电子像4.0nm@30kV

3. 加速电压范围：200V－30kV，10V步进连续可调

4. 放大倍数范围：7X－1,000,000X，连续可调，无需高倍率和低倍率转换

5. 电子束束流：0.5pA-5μA

6. 电子束控制：具有分辨率模式、分析模式、大视野模式、大景深模式用于快速的样品定位

7. 分析工作距离：35º出射角时分析工作距离8.5mm

8. 抽真空系统：涡轮分子泵 + 机械泵

9. 样品室最高真空度：优于6 x 10-4 Pa

10. 样品室尺寸：365mm(直径)×275mm(高)

11. 样品尺寸：最大可装载样品直径250mm

12. 样品台类型：全电动5轴马达驱动样品台

13. 样品台马达移动范围：X=125mm，Y=125mm，Z=50mm，T=-10°~  90°，R=360°

14. 样品台具有接触报警与自停功能

15. 图像存储分辨率(最大)：32k×24k 像素

16. 图像显示分辨率：1024×768像素

17. 图像采集：像素平均、帧平均、帧积分、行平均、行积分

18. 显示方式：全屏显示、分屏显示、灰度直方图、轮廓方式、伪彩色

19. 图像注释与数据区：提供标准数据区和定制数据区，可在图片上显示各种电镜参数和字符

20. 状态菜单：显示各种工作参数

21. 测量功能：可对图像中的形貌进行点间距、角度、直径等测量

22. 图像存储格式：TIF、BMP、JPG

23. 具有多种自动控制功能：自动电子枪启动，电子枪自动对中，自动偏压调整，自动镜筒参数控制，磁滞校正，自动聚焦，聚焦补偿，动态聚焦，旋转补偿，自动消像散，图像混合，扫描旋转，倾斜补偿，图像降噪处理，图像居中功能

 Technical Parameters:

1. Emission source: tungsten filament

2. Resolution: secondary electron image 3.0nm@30kV; backscattered electron image4.0nm@30kV

3. Accelerating voltage range: 200V-30kV, continuously adjustable in 10V steps

4. Magnification range: 7X－1,000,000X, continuouslyadjustable, no need for high magnification and low magnification conversion

5. Electron beam current: 0.5pA-5μA

6. Electron beam control: with resolution mode, analysis mode, large field of viewmode, large depth of field mode for fast sample positioning

7. Analytical working distance: 8.5mm when the exit angle is 35º

8. Vacuum system: turbo molecular pump + mechanical pump

9. Thehighest vacuum in the sample chamber: better than 6 x 10-4 Pa

10. Sample room size: 365mm (diameter) × 275mm (height)

11. Sample size: The maximum sample diameter that can be loaded is 250mm

12. Sample stage type: fully electric 5-axis motor drive sample stage

13. Sample stage motor movement range: X=125mm, Y=125mm, Z=50mm, T=-10°~ 90°,R=360°

14.  Thesample stage has contact alarm and self-stop functions

15. Image storage resolution (maximum): 32k×24k pixels

16. Image display resolution: 1024×768 pixels

17. Image acquisition: pixel average, frame average, frame integration, lineaverage, line integration

18. Display mode: full-screen display, split-screen display, grayscale histogram,contour mode, pseudo-color

19. Image annotation and data area: Provide standard data area and customized dataarea, which can display various electron microscope parameters and characterson the picture

20. Status menu: display various working parameters

21. Measurement function: can measure the distance, angle, diameter, etc. of thetopography in the image

22. Image storage format: TIF, BMP, JPG

23.  Ithas a variety of automatic control functions: automatic electron gun start,automatic electron gun alignment, automatic bias adjustment, automatic lensbarrel parameter control, hysteresis correction, automatic focus, focuscompensation, dynamic focus, rotation compensation, automatic astigmatismreduction, Image mixing, scan rotation, tilt compensation, image noisereduction processing, image centering function

基本应用：

扫描电镜(SEM)广泛地应用于金属材料(钢铁、冶金、有色、机械加工)和非金属材料(化学、化工、石油、地质矿物学、橡胶、纺织、水泥、玻璃纤维)等检验和研究。

在材料科学、金属材料、陶瓷材料半导体材料、化学材料等领域，进行材料的微观形貌、组织、成分分析。各种材料的形貌组织观察，材料断口分析和失效分析，材料实时微区成分分析，元素定量、定性成分分析，快速的多元素面扫描和线扫描分布测量，晶体/晶粒的相鉴定，晶粒尺寸、形状分析，晶体、晶粒取向测量。

 Basic application:

Scanningelectron microscopy (SEM) is widely used in the inspection and research ofmetal materials (steel, metallurgy, non-ferrous metals, machining) andnon-metal materials (chemical, chemical, petroleum, geological and mineralogy,rubber, textile, cement, glass fiber).

In thefields of materials science, metal materials, ceramic materials, semiconductormaterials, chemical materials, etc., conduct material microscopic morphology,organization, and composition analysis. Observation of morphology and structureof various materials, material fracture analysis and failure analysis, materialreal-time micro-domain composition analysis, element quantitative and qualitativecomposition analysis, rapid multi-element surface scanning and line scanningdistribution measurement, crystal/grain phase identification, crystal Analysisof grain size and shape, measurement of crystal and grain orientation.

使用二次电子探测器对锌磷酸电泳涂层成像。水平观察视野约 20 μm

莓状黄铁矿的表面结构

使用 F80 铝矾土砂完成喷砂清理后的 S355 钢表面

集成电路表面上清晰可辨的碎片和脏污。在高真空 10kV 下使用二次探测器成像