APMCM（亚太地区数模竞赛）2020年-A题：Laser Marking Hatch Contour Generation（附获奖论文及matlab代码实现）

目录

Summary

1 Introduction

1.1 Problem Background

1.2 Restatement of the Problem

1.3 Our Work

2 General Assumptions

3 Notations

4 Model I: Zigzag Parallel Hatch

4.1 Zigzag Parallel Hatch of the Single-layer Contour Pattern

4.2 Zigzag Parallel Hatch of the Mutually Nested Multi-layer Contour Patterns

4.3 Algorithm

5 Model II: Contour Parallel Hatch

5.1 Contour Parallel Hatch of the Single-layer Contour Pattern

5.2 Contour Parallel Hatch of the Mutually Nested Multi-layer Contour Patterns

5.3 Algorithm

6 Results

6.1 Isometric fifill pattern

6.2 Calculation results

7 Test the Model

7.1 Analysis of Algorithm Performance

7.1.1 Defifinition of

7.1.2 Assessment of Im

7.1.3 Assessment of E

7.2 Strategy for Optimizing the Performance and Effiffifficiency of the Hatching Algorithm

8 Strengths and weaknesses

8.1 Strengths

8.2 Weaknesses

References

Appendices

Appendix A Tools and software

Appendix B The Codes

Make circle

 Inward

 Reset Point

---

Summary

Laser marking has been widely used in industrial processing. For difffferent hatching methods,

the operating effiffifficiency and the clarity of the marking pattern are also difffferent. We need to

realize the zigzag parallel and contour parallel hatch of the single-layer and multi-layer contour

pattern respectively based on difffferent parameters, evaluate the algorithm, and give optimization

strategies. Three models are established: Model I: Zigzag Parallel Hatch Model; Model II: </