上一次已经写了以下关于器件结构的仿真,这一次就写一下器件的特性,所使用的sentaurus的版本为2018版,可能会因为版本问题而导致跑出来的结果不一样,但是可以修改材料参数,我使用的是2018版自带的4H-SiC材料参数。很多材料参数可以从http://www.ioffe.ru/SVA/NSM/Semicond/index.html来查找,不过有些参数比较老,个人建议还是使用新的软件自带的参数。
OK,还是老规矩,先上代码
Electrode {
{
Name="emitterright" Voltage= 0.0 }
{
Name="emitterleft" Voltage= 0.0 }
{
Name="gate" Voltage= 0.0 material= PolySi(N)}
{
Name="collector" Voltage= 0.0}
}
File {
Grid= "@tdr@"
Plot= "@tdrdat@"
Current= "@plot@"
Output= "@log@"
Parameter= "@parameter@"
}
Physics {
Recombination (
SRH(DopingDep TempDep)
Auger
)
Aniso (
eMobilityFactor (Total) = 0.83
hMobilityFactor (Total) = 1.00
)
Mobility (
DopingDependence
HighFieldSaturation
Enormal
)
IncompleteIonization
EffectiveIntrinsicDensity ( oldSlotboom NoFermi )
}
#Physics(MaterialInterface= "SiliconCarbide/Oxide") {Traps (FixedCharge Conc=2e12)}
Plot {
TotalCurrentDensity/vector
eDensity hDensity
eCurrent hCurrent
ElectricField/vector
eQuasiFermi hQuasiFermi
egradQuasiFermi hgradQuasiFermi
Potential Doping SpaceCharge
SRH Auger
AvalancheGeneration
eAvalanche hAvalanche
eMobility hMobility
DonorConcentration AcceptorConcentration
Doping
eVelocity hVelocity
BarrierTunneling
ConductionBandEnergy ValenceBandEnergy BandGap
eQuasiFermi hQuasiFermi
NonLocal
}
Math {
ExtendedPrecision(128)
Iterations= 50
Notdamped&#